Microstructure and growth mechanism of tungsten carbide coatings by atmospheric CVD

Abstract A tungsten carbide coating was prepared by atmospheric chemical vapor deposition (CVD) with tungsten hexafluoride (WF 6 ), hydrogen, and dimethyl ether (DME) as the reaction gases, under a dimethyl ether partial pressure (P DME ) of 3.2–21.0 kPa and a temperature of 550–600 °C. The phase compositions of the coatings are W 2 C + W and W 3 C + W, and it is found that when P DME is low, the coating has a lamellar structure, but at a high P DME , the lamellar structure and fibrous tissue are simultaneously present in the scanning electron microscope (SEM) image. In the latter case, no delamination was found, which was visible at a low P DME . In addition, as the P DME increases, the deposition rate of the coating decreases, and ultimately, the coating cannot continue to grow. The growth model of the tungsten carbide coating based on the kinetics of the chemical vapor deposition of tungsten by the hydrogen reduction of tungsten hexafluoride was proposed, and the influences of P DME and temperature on the coatings were discussed and the orientation relationship between W and W 2 C in high resolution transmission electron microscopy (HRTEM) was analyzed.