Fast optical limiting on volatilizable metallic mirror

Abstract We report on the investigation into an optical limiter, utilizing ablation destruction of a thin-film metallic mirror affected by high-intensity laser irradiation with nanosecond pulse duration. Its limiting threshold and dynamic range showed up being dependent on both the type of a material used and the thickness of the metallic film, as well as the type of the substrate material. An aluminum film deposited onto a polycarbonate substrate with reflection coefficient of weak irradiation being 90% has a limiting threshold 30 mJ/cm 2 , whilst reflection coefficient drops down to 1% at pulse energy density 200 J/cm 2 , wavelength being 1.06 μm.