PECVD Al 2 O 3 for Surface Passivation: a Review of Solar Cell and Thin Layer Characteristics

A review about Al 2 O 3  surface passivation for Si solar cell applications is presented. Whereat, a focus to the industrially relevant deposition technique PECVD is given. Al 2 O 3  was already adapted to several cell concepts including PERC, PERT, TOPCon, EWT and IBC. Latest record cell efficiencies using Al 2 O 3  passivation are summarized in this publication. Further, the passivation mechanism and the structure of Al 2 O 3  are discussed in detail.