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Low-temperature pre-metal dielectrics for future ICs
Low-temperature pre-metal dielectrics for future ICs
1998
S. Nag
R Ramamurthy
W.J. Lei
C. Monteil
M. Hickey
Keywords:
Dielectric
Electronic engineering
Chemical vapor deposition
Chemistry
Metal
Integrated circuit
Nanotechnology
deposition process
Plasma
Correction
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