Photocurrent spectroscopy investigation of deep level defects in Mg-doped GaN and Mg-doped AlxGa1−xN(0.20<x<0.52)

Pulsed infrared photocurrent spectroscopy is used to investigate deep levels in highly resistive metal organic chemical vapor deposition-grown, magnesium-doped aluminum gallium nitride metal-semiconductor-metal test structures in the range of aluminum fraction from x=0.0 to x=0.52. Some background level of photocurrent is observed at all infrared pump wavelengths between 1.35 and 4.0 μm. The photocurrent decay time is a decreasing function of aluminum fraction. A peak photocurrent energy is observed for each aluminum fraction. With increasing aluminum fraction, the peak blueshifts and narrows.