Film deposition using a non-thermal microwave-generated microplasma at atmospheric pressure

Summary form only given. A microplasma based on a microstrip split-ring resonator 1 (SRR) discharge has been used in atmospheric pressure gas mixtures to deposit hard films onto glass substrates. The SRR can generate steady-state plasma densities 2 on the order of 10 14 cm −3 , potentially allowing access to unique materials-processing parameter spaces.