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Basic development of a 1.5 micrometer very large scale integrated technique, part 1-4
Basic development of a 1.5 micrometer very large scale integrated technique, part 1-4
1985
H. Fehling
F. Schmidt
W. Doerner
M Schwarz
H. Feindt
L. Warmuth
Keywords:
Optoelectronics
Wafer
Materials science
Photomask
Photoengraving
Microelectronics
Photolithography
Plasma etching
Micrometer
Multiplexing
Correction
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