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Growth of polycrystalline Si on plastic substrate using pulsed-plasma CVD under near atmospheric pressure
Growth of polycrystalline Si on plastic substrate using pulsed-plasma CVD under near atmospheric pressure
2009
Murashige Shogo
Matsumoto Mitsutaka
Inayoshi Yohei
Suemitsu Maki
Nakajima Setsuo
Uehara Tsuyoshi
Toyoshima Yasutake
Keywords:
Plasma
Polycrystalline silicon
Atmospheric pressure
Analytical chemistry
Substrate (chemistry)
Crystallite
Plasma-enhanced chemical vapor deposition
Polyethylene terephthalate
Materials science
Composite material
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