Microwave methods for measuring the electrical conductivity and thickness of materials and structures in a wide range of their values

The results of measurements of parameters of materials and structures with utilization of microwave reflection spectra are presented. The possibility of the inverse problem solving to determine the thickness and electrical conductivity of nanometer metal films and semiconductor layers in multilayer structures in a wide range of their values has been shown. The problem of simultaneous determining both these parameters at the different temperatures has been solved.