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HCl表面処理とプラズマ励起原子層堆積SiNx膜によるAlGaN/GaN HEMTの表面安定化
HCl表面処理とプラズマ励起原子層堆積SiNx膜によるAlGaN/GaN HEMTの表面安定化
2017
suzuki takayuki
tutiya akira suke
ooyasu takahiro
akazawa yosihiko
simotuke takasi
matumoto kouta
eguti takuya
iwata tyoku taka
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