High-rate deposition of microcrystalline silicon p-i-n solar cells in the high pressure depletion regime

2008 
Hydrogenated microcrystalline silicon films (μc-Si:H) deposited at high deposition rates (∼2 nm/s) by means of the very-high-frequency (VHF) deposition technique in the high pressure depletion regime have been integrated into single junction p-i-n solar cells. It is demonstrated that μc-Si:H solar cells can be optimized using a twofold approach. First the bulk properties, deposited under steady-state plasma conditions, are optimized by monitoring the presence of crystalline grain boundaries in μc-Si:H. These hydrogenated crystalline grain boundaries can easily be detected via the crystalline surface hydrides contribution to the narrow high stretching modes by infrared transmission spectroscopy. The crystalline grain boundaries suffer from postdeposition oxidation which results in a reduced red response of the solar cell. The absence of these crystalline surfaces in an as-deposited μc-Si:H matrix reflects the device grade microcrystalline bulk material. Second, the prevention of silane backdiffusion from t...
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