Double patterning lithography study with high overlay accuracy
2010
Double patterning (DP) has become the most likely candidate to extend immersion lithography to the 32 nm node and
beyond. This paper focuses on experimental results of 32nm half pitch patterning using NSR-S620D, the latest Nikon
ArF immersion scanner. A litho-freeze-litho (LFL) process was employed for this experiment. Experimental results of
line CDU, space CDU, and overlay accuracy are presented. Finally, a budget for pitch splitting DP at the 22 nm half
pitch is presented.
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