Maskless graphic exposure system based on spatial light modulator

The invention discloses a maskless graphic exposure system based on a spatial light modulator, comprising a lighting light source, a light beam shaping system matched with the lighting light source, a spatial light modulator, a polarizing optical device matched with the spatial light modulator, a projecting lens and a wafer support along the direction of the optical axis, wherein a wafer to be exposed is fixed on the wafer support; the spatial light modulator and the wafer support satisfy an object-image conjugate relation about the projecting lens; light emitted by the lighting light source is shaped into an even lighting light beam adaptive to the size of the spatial light modulator by the light beam shaping system, thus lighting the spatial light modulator; and with the coordination of the matched polarizing optical device, the spatial light modulator is capable of displaying various graphic structures through the control of a computer; and subsequently, the displayed graphic structures can be projected and imaged onto a wafer through the projecting lens, thereby performing maskless exposure on the wafer.