Challenges to realize EUV-FEL high power light source exceeding 10 kW by ERL accelerator technology

A high power EUV-FEL light source based on an Energy Recovery Linac (ERL) is one of the most promising light sources for future lithography, so that some feasibility studies from the view point of accelerator technology have been done. According to the comments from semiconductor industry, it is also important to reduce the size of the accelerator systems to be installed in a usual LSI Fab. Several feasibility studies and challenges on accelerator elements and system are presented.