Effects of vanadate supply on plant growth, Cu accumulation, and antioxidant capacities in Triticum aestivum L.

The effects of normal vanadate (V) supply (40 μM) on copper (Cu) accumulation, plant growth and reduction in Cu toxicity in wheat seedlings (Triticum aestivum L.) were investigated. The results showed Cu accumulation (mg g−1 dw) in the applied V treatment was about 10.2 % in shoots and 16.7 % in roots higher up on exposure to excess Cu (300 μM) than that observed only in excess Cu plants. Compared with the treatment of the normal concentration used in Hoagland’s culture solution Cu (0.6 μM), excess Cu significantly induced lipid peroxidation indicated by accumulation of thiobarbituric acid reactive substances (MDA). The seedlings showed apparent symptoms of Cu toxicity and plant growth were significantly inhibited by excess Cu. The applied V significantly decreased lipid peroxidation in roots caused by excess Cu and inhibited the appearance of Cu toxicity symptoms. Moreover, the applied V effectively improved the antioxidant defense system to alleviate the oxidative damage induced by Cu. Although the addition of V could promote superoxide dismutase in both shoots and roots to reduce superoxide radicals, peroxidase and catalase in shoots and ascorbate peroxidase and dehydroascorbate reductase in roots were major enzymes to eliminate H2O2 in wheat seedlings.