A method of manufacturing a device FinFet

The present invention provides a method of manufacturing a FinFet device, comprising: providing a substrate; the substrate is doped source and drain; after etching the substrate doped to form source and drain regions; source and drain regions a channel is formed between the fin; forming a gate on the fin channel. After the completion of the present invention on the substrate source and drain doping, performed before the fin and forming a gate, the source and drain doping such as doped planar devices, to ensure the quality of the source and drain doping, improves the performance of the device FinFet .