Study of the Growth Mechanisms and Properties of (Cr,O,N) Films Deposited by Vacuum Arc Evaporation

Ternary chromium based films (Cr,O,N) have been deposited using the vacuum arc evaporation technique in a reactive (O 2 + N 2 ) atmosphere. The influence of the oxygen flow rate (Q o2 ) on the structural and mechanical properties of the coatings, has been investigated when the nitrogen flow rate is held constant. It has been found that compounds composed on chromium, oxygen and nitrogen with a high hardness, can be deposited in a narrow range of Q o2 .