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Ultrathin Silicon Nitride Films Fabricated by Single-Wafer Processing Using an SiH2Cl2-NH3-H2 System and in situ H2 Cleaning.
Ultrathin Silicon Nitride Films Fabricated by Single-Wafer Processing Using an SiH2Cl2-NH3-H2 System and in situ H2 Cleaning.
2010
K. Kobayashi
Yutaka Inaba
T. Ogata
T. Katayama
Hiromu Watanabe
Y. Matsui
M. Hirayama
Keywords:
Nanotechnology
Silicon nitride
Wafer
In situ
Chemistry
Inorganic chemistry
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