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A latch-up free LVTSCR with improved overshoot characteristic for ESD protection in 40-nm CMOS process
A latch-up free LVTSCR with improved overshoot characteristic for ESD protection in 40-nm CMOS process
2021
Rui-bo Chen
Hong Xia Liu
Dan Guo
Wei Huang
Xiao Zong Huang
Zhiwei Liu
Keywords:
overshoot
cmos process
Optoelectronics
Materials science
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