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Strain analysis of Si1-xGex embedded source/drain transistors by nano-beam diffraction
Strain analysis of Si1-xGex embedded source/drain transistors by nano-beam diffraction
2009
Paola Favia
Mireia Bargallo Gonzalez
Eddy Simoen
Peter Verheyen
Hugo Bender
Keywords:
Nano-
Transistor
Beam (structure)
Diffraction
Analytical chemistry
Materials science
Strain (chemistry)
Optoelectronics
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