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Defect dispositioning using mask printability on attenuated phase-shift production photomasks
Defect dispositioning using mask printability on attenuated phase-shift production photomasks
2001
Justin W. Novak
Benjamin George Eynon
Eric Poortinga
Anja Rosenbusch
Yair Eran
Keywords:
Optoelectronics
Materials science
Photomask
Correction
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