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Sub-45 nm Pattern Mold for Nanoimprint Manufactured with Focused Ion Beam on Diamond and Si
Sub-45 nm Pattern Mold for Nanoimprint Manufactured with Focused Ion Beam on Diamond and Si
2006
M. Chung
L. J. Shin
H.F. Ho
B. R. Huang
J.M. Chiou
M.H. Weng
Y. Tzeng
Keywords:
Nanotechnology
Diamond
Focused ion beam
Materials science
Mold
Correction
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