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Development of Cu Etching Using O₂ Cluster Ion Beam under Acetic Acid Gas Atmosphere (Special Issue : Dry Process)
Development of Cu Etching Using O₂ Cluster Ion Beam under Acetic Acid Gas Atmosphere (Special Issue : Dry Process)
2012
Takanori Suda
Noriaki Toyoda
Ken-ichi Hara
Isao Yamada
Keywords:
Ion beam
Atmosphere
Acetic acid
Etching
Inorganic chemistry
Chemistry
Correction
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