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Contribution of ion species to thin film deposition of silicon dioxide in oxygen/silane helicon diffusion plasmas
Contribution of ion species to thin film deposition of silicon dioxide in oxygen/silane helicon diffusion plasmas
1996
C. Charles
R.W. Boswell
Keywords:
Oxygen
Silicon dioxide
Thin film
Plasma
Materials science
Chemical engineering
Helicon
Silane
Ion
Correction
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