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Improvement of Ferroelectric STN Thin Film Properties by Oxygen Radical Treatment
Improvement of Ferroelectric STN Thin Film Properties by Oxygen Radical Treatment
2004
Tatsunori Isogai
Ichirou Takahashi
Hiroyuki Sakurai
Tetsuya Goto
Masaki Hirayama
Akinobu Teramoto
Shigetoshi Sugawa
Tadahiro Ohmi
Keywords:
Thin film
Radical
Krypton
Photochemistry
Ferroelectricity
Materials science
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