Numerical analysis of DUV scatterometry on EUV masks
2007
We investigated the potential, applicability, and advantages of DUV scatterometry including DUV ellipsometry for the
dimensional characterisation of the absorber structures on EUV photomasks. By means of numerical investigations on
the basis of rigorous diffraction calculations we demonstrate the sensitivity of DUV scatterometry with regard to
dimensions and geometry of the absorber structures. Further we show, that in contrast to at-wavelength scatterometry in
the EUV scatterometry in the DUV spectral range is nearly insensitive to perturbations of the reflecting MoSi multilayer.
As for EUV scatterometry the separation of absorber structure and multilayer parameters is sometimes difficult the
application of DUV scatterometry allows for an easy separation. It is further on verified, that for this reason a quite good
reconstruction of geometry and size of the absorber structures from measured data is possible. Finally we prove the
sensitivity of DUV ellipsometric measurements, a feature, which is not (yet) available in the EUV spectral range.
Because of these results we estimate DUV scatterometry to be an excellent metrology method for in-line monitoring and
process optimization in the fabrication process of EUV masks.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
0
References
5
Citations
NaN
KQI