Alkoxide compound and raw material for forming thin film

An alkoxide compound represented by general formula (I); and a raw material for forming a thin film, which comprises the alkoxide compound. In the formula, R 1 represents a linear or branched alkyl group having 2-4 carbon atoms; and R 2 and R 3 independently represent a linear or branched alkyl group having 1-4 carbon atoms. In general formula (I), it is preferred that R 1 is an ethyl group. It is also preferred that R 2 and/or R 3 is an ethyl group. The raw material for forming a thin film which comprises an alkoxide compound represented by general formula (I) is preferably used as a raw material for a chemical vapor deposition method.