Thermal Stability of Filtered Vacuum Arc Deposited Er2O3 Coatings

Erbium oxide (Er 2 O 3 ) coatings were deposited using filtered vacuum arc deposition (FVAD) and their structure and thermal stability were studied as a function of fabrication parameters. The coatings were deposited on silicon wafer and tantalum substrates with an arc current of 50 A and a deposition rate of 1.6 ± 0.4 nm/s. The arc was sustained on truncated cone Er cathodes. The influence of oxygen pressure ( P = 0.40-0.93 Pa), bias voltage ( V b = -20, -40 or grounded) and substrate temperature (room temperature (RT) or 673K) on film properties was studied before and after post deposition annealing (1273K for 1 hour, at P ~ 1.33 Pa). The coatings were characterized using X-ray diffraction (XRD), optical microscopy, scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and Knoop Hardness. Optical microscope images indicated that the coatings had very low macroparticle concentration on their surface. The macroparticle diameters were less than 2.5 I¼m. The coatings were composed of only Er 2 O 3 without any metallic phase under all deposition parameters tested. The coatings deposited on RT substrates were XRD amorphous and had a featureless cross-section microstructure. However, the coatings deposited on 673K heated substrates had a C -Er 2 O 3 structure with (222) preferred orientation and weak columnar microstructure. The coating hardness varied with deposition pressure and substrate bias, and reached a maximum value of 10 GPa at P = 0.4 Pa and V b = -40 V. The post-deposition annealing caused crystallization, and the coatings hardness dropped to 4 GPa with thermal treatment. However, after post-deposition annealing, no peeling or cracking appeared at the coating surface or the interface with the substrate.