Study on organosilicon positive resist. III. Organosilicon positive excimer laser resist (OSPR‐2016)

A new alkali-developable organosilicon positive excimer laser (KrF) resist (OSPR-2016) has been developed for a bilayer resist system. OSPR-2016 is composed of poly (p-hydroxybenzylsilsesquioxane) and methyl cholate-tris (α-diazoacetoacetate). The ratio is 72.5 : 27.5 w/w. A sample of 0.5-μm thick OSPR-2016 resolved 0.35 μm L&S patterns when exposed to a dose of 320 ml/cm 2 from an excimer laser projection printer (NA=0.37)