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Low temperature MOCVD of Ta2O5 dielectric thin films from Ta[NC(CH3)3][OC(CH3)3]3 and O2
Low temperature MOCVD of Ta2O5 dielectric thin films from Ta[NC(CH3)3][OC(CH3)3]3 and O2
2016
Hirokazu Chiba
Ken-ichi Tada
Taishi Furukawa
Toshiki Yamamoto
Tadahiro Yotsuya
Noriaki Oshima
Hiroshi Funakubo
Keywords:
Thin film
Dielectric
Materials science
Composite material
Metalorganic vapour phase epitaxy
Tantalum oxide
deposition rate
dielectric thin films
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