Field Emission Properties of Nano-needle Carbon Films Deposited by Quartz-type MWPCVD

Nano-needle carbon films were prepared on Si substrates by quartz-type microwave plasma CVD. Good field emission properties with a threshold field of 2.2 V/μm and a current density of 65 mA/cm2 at an electric field of 9 V/μm were obtained from this carbon films. A modified F-N model conside-ring statistical effects were proposed to explain field emission data in the low electric field region. A saturation tendency of current density was found in high electric field region, it could not be explained by modified F-N model. This is awaited to more study.