Sensitivity improvement methods sensitive multilayer resist film and the resist film

EUV or electron beam sensitivity of the resist material itself gives a resist film structure capable of improving the EUV or electron beam resist of the resist layer without modification. Further, on the resist polymer layer 2 on the substrate 3 formed by laminating providing a metal layer 1 of the thin thickness of nanometer level. When exposing the resist layer in this configuration, by the surface plasmon effect of the metal layer 1 light irradiated to the resist film is enhanced, thereby improving the photosensitivity of the resist film.