Pulsed 70 kV X-ray sensing behavior of Cu2HgI4 thick films

Abstract X-ray photoconductors are widely used in flat panel X-ray detectors in medical and dental imaging systems. In the present work, X-ray photoconductivity measurement of Cu 2 HgI 4 thick film was performed using a real-time intraoral X-ray machine. To perform the sensing measurement, wet chemical derived Cu 2 HgI 4 sample was coated as a thick film by slurry deposition route on top of the tin coated copper patterned electrode. Prior to the sensing measurement, Cu 2 HgI 4 powder sample was characterized using powder X-ray diffraction, scanning electron microscope, energy dispersive x-ray analysis, Fourier transformed infrared spectroscopy and diffused reflectance spectroscopy. These analysis confirms the sample is in single phase with crystallites are in sub-spherical morphologies. The resistance of Cu 2 HgI 4 thick film was measured under the presence and absence of pulsed 70 kV X-ray for various exposure durations from 0.06 to 3.2 s using a Keithley 2450 source meter. Appreciable sensitivity against intraoral pulsed 70 kV X-ray sensing behavior of Cu 2 HgI 4 thick films explore the possibility of utilizing it as a photoconductor for flat panel X-ray imaging detectors.