Method and apparatus for processing substrates

The application describes several methods and apparatus for treating at least part regions of a substrate. In the method, a liquid are in each case at least at least applied to a portion of the substrate and introduced electromagnetic radiation in this liquid, to achieve desired effects depending on the process. In a method of the liquid by means of UV radiation, radicals are generated in the liquid, in particular prior to the application, wherein the generation of radicals is carried out on the substrate so immediately prior to the application that at least a part of the radicals thus generated reaches the substrate. be removed in a method in which ions of at least partial areas of the surface of a substrate and near-surface layers of the substrate is above ambient temperature, heated liquid applied to the substrate to form a liquid film on at least a portion of the substrate, electromagnetic radiation in such a way in the liquid film is introduced that at least a part of the radiation reaches the substrate surface. In another method for changing a surface condition of a substrate with an at least partially hydrophobic substrate surface such that at least a portion of the hydrophobic substrate surface a hydrophilic surface finish, a liquid on at least the portion of the surface is of ...