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Acemap > Paper > HVEM In Situ Investigation of Stress-Induced Grain Growth during Thermal Annealing of Thin Al-Alloy Films on a Si/SiO2 Substrate

HVEM In Situ Investigation of Stress-Induced Grain Growth during Thermal Annealing of Thin Al-Alloy Films on a Si/SiO2 Substrate

1992 
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