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Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blank
Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blank
2005
Vincent Farys
C. Charpin
Marieke Richard
Jean-Yves Robic
V. Muffato
Etienne Quesnel
S. Postnikov
P. Schiavone
Maxime Besacier
Rafik Smaali
Patrick P. Naulleau
Keywords:
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Optoelectronics
Extreme ultraviolet lithography
Materials science
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