Poly(trifluoroethylene) adsorption and heterogeneous photochlorination reactions.

Heterogeneous (gas−solid) photochlorination reactions of poly(trifluoroethylene) (PF3E) films were studied as a function of reaction time and light intensity. The rate of chlorination was found to be faster in high-intensity light when compared to the reaction in ambient light. PF3E irreversibly adsorbed to oxidized silicon and covalently attached amine monolayers supported on silicon, producing hydrophobic thin films in the thickness range of 8−40 A. Adsorption conditions such as polymer concentration and solvent composition were investigated. Radical grafting of maleic anhydride to the polymer backbone resulted in increased adsorption on oxidized silicon.