Old Web
English
Sign In
Acemap
>
Paper
>
Enhancement of the Chemical Stability of Hydrogenated Aluminum Nitride Thin Films by Nitrogen Plasma Treatment
Enhancement of the Chemical Stability of Hydrogenated Aluminum Nitride Thin Films by Nitrogen Plasma Treatment
2001
Min-Hee Cho
Youn-Seon Kang
Hae-Yeol Kim
Paul S. Lee
Jai Young Lee
Keywords:
Thin film
Nitrogen
Inorganic chemistry
Chemical stability
Materials science
Plasma
Carbon film
Nitride
Aluminium
Microstructure
Chemical engineering
nitrogen plasma
Correction
Source
Cite
Save
Machine Reading By IdeaReader
19
References
5
Citations
NaN
KQI
[]