Robust Ag/ZrO2/WS2/Pt Memristor for Neuromorphic Computing

Abstract The development of the information age has made Resistive Random Access Memory (RRAM) a critical nanoscale memristor device (MD). However, due to the randomness of the area formed by the conductive filaments (CFs), the RRAM MD still suffers from a problem of insufficient reliability. In this study, the memristor of Ag/ZrO2/WS2/Pt structure is proposed for the first time, and a layer of two-dimensional (2D) WS2 nanosheets was inserted into the MD to form 2D material and oxide double layer MD (2DOMD) to improve the reliability of single-layer devices. The results indicate that the electrochemical metallization memory cell exhibits a highly stable memristive switching and concentrated ON- and OFF-state voltage distribution, high speed (∼10 ns), and robust endurance (>109 cycles). This result is superior to MDs with a single-layer ZrO2 or WS2 film, because two layers have different ion transport rates, thereby limiting the rupture/rejuvenation of CFs to the bilayer interface region, which can greatly...