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High-index optical materials for 193-nm immersion lithography
High-index optical materials for 193-nm immersion lithography
2006
John H. Burnett
Simon G. Kaplan
Eric L. Shirley
Deane Horowitz
Wilfried Clauss
Andrew Grenville
Chris K. Van Peski
Keywords:
Photolithography
Optoelectronics
Ceramic
Lutetium
Germanium
Immersion lithography
Refractive index
Materials science
Numerical aperture
Birefringence
Correction
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