Experimental study of the damage morphology induced by the millisecond–nanosecond combined-pulse laser with different pulse delay on silicon

Abstract The damage morphologies of silicon induced by ms-ns combined-pulse laser with different pulse delay are investigated, based on the experimental investigations of the temperature, plasma plume, and damage morphology. The splashing phenomenon began to be obvious when the pulse delay was 0.8 ms, and the small holes were formed on the center of damage morphology. It was found that the process of droplet ejection might occurred after the irradiation of ns laser. The mechanism of damage morphology induced by ms–ns combined-pulse laser with different pulse delays was discussed.