Chemically amplified photoresist Zusammensetzunig and methods for their use

Photoresist compositions comprise a mixture of a phenolic polymer with a copolymer based on (meth) acrylate, which is free from ether-containing and / or carboxylic acid-containing units. The (meth) acrylate copolymer comprises a first monomer selected from the group consisting of an alkyl acrylate, substituted alkyl acrylate, an alkyl (meth) acrylate, a substituted alkyl methacrylate and mixtures thereof, and a second monomer selected from the group consisting of an acrylate, a (meth) acrylate or a mixture thereof with an acid-cleavable ester substituents; and a photo acid generator. Methods are also described for producing a photoresist image on a substrate with discloses the photoresist composition.