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New contact material for advanced CMOS: cluster-preforming-deposited amorphous Si-rich W silicide film
New contact material for advanced CMOS: cluster-preforming-deposited amorphous Si-rich W silicide film
2019
Okada Naoya
Uchida Noriyuki
Ogawa Shinichi
Kanayama Toshihiko
Keywords:
Amorphous solid
CMOS
Optoelectronics
Silicide
Materials science
Correction
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