PLD of tantalum-oxide films using 5%-ozone gas

Ta-O films were formed using KrF excimer laser ablation of a Ta target in 5 mass% O3-O2 gas. The formation process of Ta-O films was discussed with respect to the oxidization of ablated Ta particles on the deposited film surface and during the flight from the target to the substrate. The optical transparency and corrosion resistance of the Ta-O films were examined. Dense films with a smooth surface were obtained by a PLD method in 5 mass% O3-O2gas. The O/Ta ratio of the films was much improved by using 5 mass % O3-O2gas. The Ta-O films possessed high optical transparency of 80% at 400nm, and the stainless steel coated by the Ta-O film indicated the good corrosion resistance as well as Ta.