Computer simulation of plasma for plasma immersed ion implantation and deposition with bipolar pulses

In order to analyze the plasma behavior under the plasma immersion ion implantation and deposition (PIIID when a negative pulse voltage is applied to a target, a weak plasma is generated around the target. In contrast, when a positive pulse voltage is applied, a more intense plasma is generated under the same conditions. The results obtained by simulation of the behavior of ions and electrons near a trench-shaped target are presented.