Facile deposition of ultrafine silver particles on silicon surface not submerged in precursor solutions for applications in antireflective layer

Using a facile deposition method, the ultrafine silver particles are successfully deposited on the Si surface that is not submerged in precursor solutions. The ultrafine silver particles have many advantages, such as quasiround shape, uniformity in size, monodisperse distribution, and reduction of agglomeration. The internal physical procedure in the deposition is also investigated. The results show that there are more particles on the rough Si surface due to the wetting effect of solid-liquid interface. The higher concentration of ethanol solvent can induce the increase of quantity and size of particles on Si surface not in solutions. The ultrafine particles can be used to prepare porous Si antireflective layer in solar cell applications.