Developable BARC (DBARC) technology as a solution to today's implant lithography challenges
2011
As patterning of implant layers becomes increasingly challenging it is clear that the standard resist/Top Antireflective
Coating (TARC) process may be soon be limited in terms of its ability to meet implant targets at future nodes. A
particularly attractive solution for patterning implant levels is the use of a Developable Bottom Anti-Reflective Coating
(DBARC). Similar to a conventional BARC, a DBARC controls reflectivity from the underlying substrate by absorbing
the incident radiation thereby minimizing detrimental effects of reflected light. However, unlike a conventional Bottom
Anti-Reflective Coating (BARC) which requires a BARC open etch step, the DBARC is developed with the resist in a
single step leaving the substrate ready for implantation. These properties make DBARC very attractive for implant
layers.
In this paper, we report on the development of KrF and ArF DBARCs for implant applications. Our primary interest is
in developing solutions for patterning Post-Gate implant levels. We briefly describe our fundamental design concepts
and demonstrate the concepts are robust as we develop AR TM 602 DBARC to address the criteria for a production worthy
DBARC. This includes data on EBR performance, drain line compatibility, sublimation and footing coverage over
topography. In terms of lithographic performance, we demonstrate improved capability over the incumbent SLR/TARC
process in many key areas. This includes through pitch performance, process window and profile integrity over
topography for both KrF and ArF DBARC solutions. Several strategies to enhance profile by resist/DBARC matching
are also demonstrated. From a platform robustness standpoint, we show that AR602 DBARC is ready for high volume
manufacturing in terms of batch to batch control and shelf life.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
0
References
2
Citations
NaN
KQI