The phase grating mask lithography preparation method of variable duty cycle period nano

The present invention discloses a phase grating mask of variable duty cycle lithographic prepared nano-cycle approach. An exposure light source using external deep ultraviolet Preparation ± 1st order diffracted lights period phase mask photolithographic mask is reduced by half compared with nano-period grating on the basis of two technical solutions proposed for adjusting the duty cycle of the grating, First, grating duty cycle is adjusted by changing the exposure dose and the layer thickness, grating duty cycle of the second is adjusted by adjusting the deposition angle shielding layer is deposited as an etch mask in conjunction with the reactive ion etching technique. By adjusting the above-described technology and process factors to obtain a different duty cycle of the grating line width to obtain different properties in different fields of application and the duty ratio of the nano-period grating structure. The present invention is not limited to the scope of the grating material and the specific application used, and the method is simple, reliable, having outstanding technical advantages in high volume production of high-performance nanograting.