Monolithic integrated chip and manufacturing method thereof

The present invention provides a monolithic integrated chip and a manufacturing method thereof. The monolithic integrated chip includes a silicon chip, an integrated circuit arranged in a first region of the silicon chip, and a capacitance type micro-silicon microphone, wherein, the capacitance type micro-silicon microphone is arranged in a second region and electrically is connected with the integrated circuit. The silicon chip includes a silicon device layer and a silicon substrate, and the silicon device layer is a first pole plate. The monolithic integrated chip also includes a second pole plate and a cavity, wherein, the second pole plate is arranged in the second region and locates above the first pole plate, and the cavity locates between the first pole plate and the second pole plate. The first pole plate is provided with a plurality of sound apertures which run through up and down and connect the cavity. The second pole plate is provided with a movable cantilever beam type structure and suspends above the cavity, and the second pole plate is formed by adopting a low-temperature deposition process. According to the invention, the integrated circuit has a stable performance, and the capacitance type micro-silicon microphone has a high sensitivity.