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Atomic layer deposition of ruthenium for advanced interconnect applications
Atomic layer deposition of ruthenium for advanced interconnect applications
2016
Christoph Adelmann
M. Popovici
Benjamin Groven
Liang Gong Wen
Shibesh Dutta
Juergen Boemmels
Zsolt Tokei
Sven Van Elshocht
Keywords:
Atomic layer deposition
Ruthenium
Inorganic chemistry
Materials science
Interconnection
Nanotechnology
Correction
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